PECVD System and Ion Beam Etching Tool

CPV: Laboratory, optical and precision equipments (excl. glasses)

Procedure method

Award procedure without prior publication of a call for competition

Legal basis

CELEX · 32014L0024 Public Contracts Regulations 2015 (Directive 2014/24/EU)

Procurement category

Goods

Notice status

Awarded without competition

Procurement threshold

Unspecified in notice

Regulatory regime

Standard

Commercial structure

Stand-alone contract (no framework)

Competition type

Direct award (no call for competition)

GPA / WTO covered

Yes (GPA)

Recurring procurement

Unspecified in notice

First published

4 Nov 2026, 15:24 GMT

Last source update

4 Nov 2026, 15:24 GMT

Authority reference

NCA31163

FTS notice number

2026/S 000-104800

Classification (CPV)

Laboratory, optical and precision equipments (excl. glasses)

Delivery area

Scotland (UKM75)

Official registry OCID

ocds-h6vhtk-07b328 Find a Tender

Why no open competition

The procurement falls outside the scope of application of the directive

Published justification

The University requires a 2D Materials Processing Suite to establish a new cleanroom capability for growing and processing atomically thin materials, including graphene, molybdenum disulphide (MoS₂), tungsten disulphide (WS₂) and hexagonal boron nitride (hBN).

The suite must comprise two complementary systems:

• Plasma-assisted Chemical Vapour Deposition (CVD) system: Must incorporate a loadlock, support a minimum eight-line gas delivery system, enable the growth of graphene and transition metal dichalcogenides, and operate at temperatures up to 1,200°C.
• Ion Beam Etching (IBE) system: Must provide sub-nanometre etching precision, Secondary Ion Mass Spectrometry (SIMS) endpoint detection and Chemical Assisted Ion Beam Etching (CAIBE) using fluorine-based chemistry.
• A critical requirement is a retractable SIMS probe that can be safely withdrawn during CAIBE processing to prevent damage from highly reactive gases, while retaining endpoint detection capability during conventional etching processes.

Oxford Instruments has been identified as the only manufacturer able to provide a combined solution meeting all the specified technical requirements, particularly the integration of SIMS endpoint detection with a retractable probe capable of supporting CAIBE processing.

This functionality is essential for accurately processing extremely thin materials, where conventional plasma etching risks removing underlying material. The proposed equipment will establish the required 2D materials research capability while also enhancing existing thin-film processing workflows within the University's cleanroom.

Publisher note: NOTE: To register your interest in this notice and obtain any additional information please visit the Public Contracts Scotland Web Site at https://www.publiccontractsscotland.gov.uk/Search/Search_Switch.aspx?ID=847606. (SC Ref:847606)

• Oxford Instruments Nanotechnology Tools LtdAwarded supplier Halifax Road, High Wycombe, UK, HP12 3SEContact email, phoneShow contact details

No document links were published on the notice.