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Official procurement procedure
Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching
Laboratory furniture
Laboratory
optical and precision equipments (excl. glasses)
+3 more
Published value
Not published
Submission deadline Not published
Lots published1
Procurement Executive Summary
AI & Search Synopsis
Generated from official OCDS record
Tenderline Synopsis: Swansea University: "Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching". Published status: complete. Published value: Value not published. 1 published lot. Submission deadline not published. See the official notice for participation instructions.
| Contracting Authority | Swansea University | Scope & Categories | Not published | Submission Window | complete No deadline published |
|---|---|---|---|---|---|
| Submission Gateway | Direct notice route | Legal Basis & Regime | Standard procurement | Estimated Value (exc. VAT) | Not published |
Bidder Intelligence · Authority Profile: Swansea University
Market Analytics
Derived from OCDS awards & bid statistics
Published history for Swansea University. These figures describe retained records, not a forecast of bids or a measure of buyer bias.
Published-to-award variance
Not availableInsufficient comparable data
Competition Density
2Bids / Report
Supplier ConcentrationNo estimate
Insufficient attributable awardsNo concentration estimate availablePayment Terms
Check noticePublished terms
Coverage: 9 active published awards; 9 bid reports (which may be per lot). Supplier values exclude multi-supplier awards, frameworks and DPS, and use GBP only. They are published award values, not payments. Published-to-award variance compares single-lot, single-award, single-supplier GBP procedures with explicitly non-framework/non-DPS status; increases remain in the average. Unpublished data stays unknown. Awarded suppliers are winners, not all bidders.
Procedure terms
Contracting AuthoritySwansea University | Procedure methodNot published | Procurement categoryNot published |
Statuscomplete | Framework / DPSNot published | CompetitionNot published |
Above thresholdNot published | Legal basisNot published | Tender period startsNot published |
Clarification deadlineNot published | Electronic submissionNot published | Submission languagesNot published |
Published21 Jun 2021, 15:15 BST | Last source update21 Jun 2021, 15:15 BST | Recurring procurementNot published |
ClassificationLaboratory furniture, Laboratory, optical and precision equipments (excl. glasses), Miscellaneous evaluation or testing instruments, Research, testing and scientific technical simulator | ||
Delivery area | ||
OCIDocds-h6vhtk-029388 | ||
What is being bought
This Tender Specification is for the supply and delivery of a Plasma Etch Tool for SiC etching. In procuring this system, the University is seeking to augment its well-established existing plasma etch and deposition tool set, expanding the capabilities that the CISM will be able to provide.
The new tool will be of strategic importance in delivering both frontside SiC etch capability for power MOSFET trench applications, and backside SiC via etch capability for GaN-on-SiC device applications. Reliability of the equipment is therefore paramount to maintaining, supporting and complimenting the wide array of experimental work that will be conducted within the facility.
What changed
From the official release history
- tender value changed
21 Jun 2021, 15:15 BST - Status changed to complete
21 Jun 2021, 15:15 BST - Official notice release published
21 Jun 2021, 15:15 BST - Submission deadline changed to published date
21 Jun 2021, 15:15 BST - Published value updated to £1,000,000
16 Feb 2021, 12:48 GMT - Status changed to active
16 Feb 2021, 12:48 GMT - Official notice release published
16 Feb 2021, 12:48 GMT - Submission deadline changed to 18 Mar 2021, 12:00 GMT
16 Feb 2021, 12:48 GMT - Buyer information updated
16 Feb 2021, 12:48 GMT
Lots and requirements (1)
Published by the contracting authority
- Lot 1 · #1Individual lot title not publishedcancelledPublished valueNot publishedThis Tender Specification is for the supply and delivery of a Plasma Etch Tool for SiC etching. In procuring this system, the University is seeking to augment its well-established existing plasma etch and deposition tool set, expanding the capabilities that the CISM will be able to provide. The new tool will be of strategic importance in delivering both frontside SiC etch capability for power MOSFET trench applications, and backside SiC via etch capability for GaN-on-SiC device applications. Reliability of the equipment is therefore paramount to maintaining, supporting and complimenting the wide array of experimental work that will be conducted within the facility. Additional information: Funding for this procurement has been secured from the Driving the Electric Revolution (DER) Industrialisation Centres Programme via Innovate UK.Contract periodNot publishedEligibilityNot publishedOptions / renewalNot published
Timeline
- Procedure published
21 Jun 2021, 15:15 BST - Award active
Not published · Not published - Contract active
Signed 17 May 2021, 00:00 BST · Not published
Commercial outcome and competition
Awards SPTS Technologies Not published · Not published · active |
Contracts Contract Not published · signed 17 May 2021, 00:00 BST · active |
Bid statistics highestValidBidValue: 723000 lowestValidBidValue: 644000 bids: 2 (lot 1) electronicBids: 2 (lot 1) foreignBidsFromEU: 2 (lot 1) foreignBidsFromNonEU: 0 (lot 1) highestValidBidValue: 723000 (lot 1) lowestValidBidValue: 644000 (lot 1) smeBids: 0 (lot 1) |
Buyer and organisations in this procedure
Swansea University
Contracting authority GB-FTS-177Documents (0)
Official links; attachments are not copied
No linked documents are published
Related procedures (0)
No related procedures published